The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2005

Filed:

Aug. 06, 2003
Applicants:

Robert L. Gerlach, Portland, OR (US);

Mark W. Utlaut, Scappoose, OR (US);

Michael R. Scheinfein, West Vancouver, CA;

Inventors:

Robert L. Gerlach, Portland, OR (US);

Mark W. Utlaut, Scappoose, OR (US);

Michael R. Scheinfein, West Vancouver, CA;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J037/26 ; H01J037/12 ;
U.S. Cl.
CPC ...
Abstract

A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.


Find Patent Forward Citations

Loading…