Company Filing History:
Years Active: 2008-2010
Title: The Innovations of Michael Pokoj
Introduction
Michael Pokoj is a notable inventor based in Fernwald, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) through his innovative patents. With a total of 2 patents, Pokoj's work focuses on advanced materials that have applications in various industries.
Latest Patents
His latest patents include "Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)" and "Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)." The first patent relates to specific novel tungsten and molybdenum compounds that are utilized for the deposition of tungsten- or molybdenum-containing layers via chemical vapor deposition. The second patent describes tantalum and niobium compounds with a general formula that are also used in the CVD process.
Career Highlights
Throughout his career, Michael Pokoj has worked with prominent companies such as H.C. Starck Clevios GmbH and H.C. Starck GmbH. His experience in these organizations has allowed him to develop and refine his expertise in the field of chemical vapor deposition.
Collaborations
Pokoj has collaborated with notable colleagues, including Knud Reuter and Jörg Sundermeyer. These partnerships have contributed to his innovative work and the advancement of technology in his area of expertise.
Conclusion
Michael Pokoj's contributions to the field of chemical vapor deposition through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in material science and technology.