Buelach, Switzerland

Michael Lauffer

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kistler Holding Ag. Active years: 2023.


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Michael Lauffer - Innovator in Measuring Systems

Introduction

Michael Lauffer is a notable inventor based in Bülach, Switzerland. He has made significant contributions to the field of measuring systems, particularly through his innovative patent. His work focuses on enhancing the efficiency and accuracy of detecting physical variables.

Latest Patents

Michael Lauffer holds a patent for a "Method and computerized measuring system for configuring a system to detect a measured physical variable." This invention pertains to measuring systems that consist of multiple transmission members forming a measuring chain. These transmission members are in a cause-and-effect relationship, allowing for precise detection of the specified physical variable. The method involves several steps, including specifying the measured variable, compiling measuring chains, determining performance criteria, assessing the chains, and identifying the most effective measuring chain.

Career Highlights

Lauffer is currently associated with Kistler Holding AG, a company known for its expertise in measurement technology. His role at Kistler has allowed him to apply his innovative ideas in practical settings, contributing to advancements in the industry.

Collaborations

Michael Lauffer collaborates with talented professionals such as Marco Angliker and Viola Ehrensperger. Their teamwork fosters a creative environment that enhances the development of innovative solutions in measuring technology.

Conclusion

Michael Lauffer's contributions to measuring systems exemplify the impact of innovation in technology. His patent reflects a commitment to improving measurement accuracy and efficiency. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
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