Michael L Kirk

Title: The Innovations of Michael L Kirk

Introduction

Michael L Kirk is an accomplished inventor based in Bloomfield, NY (US). He holds a total of 3 patents that showcase his expertise in radio frequency technology. His work has significantly contributed to advancements in the plasma processing industry.

Latest Patents

One of his latest patents is titled "Multiple radio frequency power supply control of frequency and phase." This innovative system features a first RF generator and a second RF generator, where the first generator controls the frequency of the second. The system includes a power source, a sensor, and a sensor signal processing unit that scales the frequency of the first RF generator to manage the second generator's frequency. Another notable patent is "RF metrology characterization for field installation and serviceability for the plasma processing industry." This system allows for the field substitution of components within an RF metrology system, utilizing a sensor/cable combination and an analysis unit. Parameters are determined before field placement, enabling recalibration for substituted units in the field.

Career Highlights

Throughout his career, Michael has worked with prominent companies such as MKS Instruments, Inc. and Eni Technology, Inc. His experience in these organizations has allowed him to refine his skills and contribute to significant technological advancements.

Collaborations

Michael has collaborated with notable professionals in his field, including David J Coumou and Clifford C Weatherell. These partnerships have further enriched his work and innovation in radio frequency technology.

Conclusion

Michael L Kirk's contributions to the field of radio frequency technology are noteworthy, with his patents reflecting his innovative spirit and technical expertise. His work continues to influence the plasma processing industry and beyond.