This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2000.
Company Filing History:
Years Active: 2000
Title: Michael Junghahnel: Innovator in Magnetron Sputtering Technology
Introduction
Michael Junghahnel is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of magnetron sputtering technology, holding 2 patents that showcase his innovative approaches. His work primarily focuses on methods and apparatuses for applying carbon layers and thin film magnetic disks.
Latest Patents
Junghahnel's latest patents include a magnetron sputtering method and apparatus utilizing a pulsed energy. This procedure describes a process for the application of carbon layers using reactive magnetron sputtering. The method involves sputtering at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. Various embodiments of this invention include the detection and limitation of 'microarcs' and executing regeneration processes at predetermined time intervals.
Another significant patent is the pulsed DC sputtering method of thin film magnetic disks. This method details the deposition of an underlayer and/or a magnetic thin film layer on data storage disks. The sputtering power is supplied in pulses to periodically ignite the plasma and enhance charge-carrier density in the sputtering chamber. The parameters for the pulses and pauses are adjusted to achieve the desired coercive field strength of the magnetic layer.
Career Highlights
Michael Junghahnel is currently employed at International Business Machines Corporation (IBM), where he continues to develop innovative technologies in the field of sputtering. His work has contributed to advancements in data storage and material application techniques.
Collaborations
Some of his notable coworkers include Klaus Goedicke and Torsten Winkler, who have collaborated with him on various projects related to his patents.
Conclusion
Michael Junghahnel's contributions to magnetron sputtering technology reflect his innovative spirit and dedication to advancing the field. His patents demonstrate a commitment to improving processes that are essential in modern technology.