The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2000
Filed:
May. 15, 1998
Klaus Goedicke, Dresden, DE;
Michael Junghahnel, Dresden, DE;
Torsten Winkler, Radeberg, DE;
Artur Lang, Worms, DE;
Dieter Meyer, Bad Nauheim, DE;
Manfred Muller, Essenheim, DE;
Hans-Herrmann Schneider, Heidesheim, DE;
Rainer C Schneider, Bischofsheim, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and apparatus for depositing an underlayer and/or a magnetic thin film layer on a data storage disk are described. The sputtering power is supplied in the form of pulses during the application of the underlayer and/or magnetic storage to periodically ignite the plasma and increase the charge-carrier density in the sputtering chamber. The repetition frequency and parameters for the pulses and pauses between pulses are adjusted to achieve a desired nominal value for the coercive field strength of the magnetic layer. Preferably the repetition frequency of the power switching is from 10 to 80 kHz and the ratio of pulse length to pulse pause is within 5:1 to 1:5.