Dieter W Meyer

Title: Dieter W Meyer: Innovator in Magnetron Sputtering Technology

Introduction

Dieter W Meyer is a notable inventor based in Bad Nauheim, Germany. He has made significant contributions to the field of magnetron sputtering technology, holding 2 patents that showcase his innovative approaches to thin film deposition.

Latest Patents

Meyer’s latest patents include a magnetron sputtering method and apparatus utilizing a pulsed energy. This invention describes a procedure and apparatus for applying carbon layers using reactive magnetron sputtering. The process involves sputtering at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. During the pulse pattern period, all targets are switched on as an anode, ensuring at least one target remains active at all times. Various embodiments of this invention include the detection and limitation of 'microarcs' and executing regeneration processes at predetermined time intervals. Another significant patent is the pulsed DC sputtering method of thin film magnetic disks. This method describes depositing an underlayer and/or a magnetic thin film layer on data storage disks, with sputtering power supplied in pulses to enhance plasma ignition and charge-carrier density.

Career Highlights

Dieter W Meyer is currently associated with the International Business Machines Corporation (IBM), where he continues to develop and refine his innovative technologies. His work has significantly impacted the field of data storage and thin film applications.

Collaborations

Meyer has collaborated with notable coworkers, including Klaus Goedicke and Michael Junghahnel, contributing to advancements in their respective fields.

Conclusion

Dieter W Meyer stands out as a prominent inventor in the realm of magnetron sputtering technology. His patents reflect a deep understanding of the complexities involved in thin film deposition processes. His contributions continue to influence the industry and pave the way for future innovations.