Manfred Muller

Title: Manfred Muller: Innovator in Magnetron Sputtering Technology

Introduction

Manfred Muller is a notable inventor based in Essenheim, Germany. He has made significant contributions to the field of magnetron sputtering technology, holding 2 patents that showcase his innovative approaches to thin film deposition.

Latest Patents

Muller's latest patents include a magnetron sputtering method and apparatus utilizing a pulsed energy. This invention describes a procedure and apparatus for applying carbon layers using reactive magnetron sputtering. The process involves sputtering at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. During the pulse pattern period, all targets are switched on as an anode, ensuring at least one target remains active at all times. Various embodiments of this invention include the detection and limitation of 'microarcs' and executing regeneration processes at predetermined time intervals. Another significant patent is the pulsed DC sputtering method for thin film magnetic disks. This method describes depositing an underlayer and/or magnetic thin film layer on data storage disks, utilizing pulsed power to ignite plasma and enhance charge-carrier density in the sputtering chamber.

Career Highlights

Manfred Muller is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in magnetron sputtering technology. His work has contributed to advancements in data storage and thin film applications.

Collaborations

Muller has collaborated with notable coworkers, including Klaus Goedicke and Michael Junghahnel, who have also contributed to the field of sputtering technology.

Conclusion

Manfred Muller is a distinguished inventor whose work in magnetron sputtering technology has led to innovative solutions in thin film deposition. His contributions continue to influence advancements in the field, showcasing the importance of innovation in technology.