Company Filing History:
2 out of 410 
1 out of 3 Years Active: 2004-2009
Title: Michael John Mangaudis: Innovator in Chemical Mechanical Polishing Technology
Introduction
Michael John Mangaudis is a notable inventor based in Worcester, MA (US). He has made significant contributions to the field of chemical mechanical polishing, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of polishing technologies used in various industries.
Latest Patents
Mangaudis's latest patents include innovative designs for chemical mechanical polishing retaining rings. One of his patents, titled "Chemical mechanical polishing retaining ring, apparatuses and methods incorporating same," describes a retaining ring that features a polymer matrix and a filler made of polyimide. This design boasts a wear rate performance not exceeding about 75 microns/hour. Another patent, "Chemical mechanical polishing retaining ring with integral polymer backing," outlines a retaining ring that consists of a support formed from a first polymer and a wear portion made from a second polymer. The first material is engineered to have a greater elastic modulus than the second, enhancing the overall performance of the retaining ring.
Career Highlights
Throughout his career, Michael John Mangaudis has worked with prominent companies, including Saint-Gobain Performance Plastics Corporation and Saint-Gobain Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of chemical mechanical polishing.
Collaborations
Mangaudis has collaborated with several professionals in his field, including David Wilkinson and Colleen E Hamilton. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Michael John Mangaudis is a distinguished inventor whose work in chemical mechanical polishing technology has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to improving the efficiency and performance of polishing processes.