The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2006

Filed:

Mar. 19, 2004
Applicants:

David Wilkinson, Aliso Viejo, CA (US);

Colleen E. Hamilton, Orange, CA (US);

Bryan David Hirschorn, Leominster, MA (US);

Michael John Mangaudis, Worcester, MA (US);

Inventors:

David Wilkinson, Aliso Viejo, CA (US);

Colleen E. Hamilton, Orange, CA (US);

Bryan David Hirschorn, Leominster, MA (US);

Michael John Mangaudis, Worcester, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In one embodiment, the disclosure is directed to a chemical mechanical polishing retaining ring. The chemical mechanical polishing retaining ring includes a support formed of a first material comprising a first polymer and a wear portion formed of a second material comprising a second polymer. The first material has an elastic modulus greater than the elastic modulus of the second material.


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