Company Filing History:
Years Active: 1995
Title: Michael J Prucha: Innovator in Chemical Vapor Deposition Technology
Introduction
Michael J Prucha is an accomplished inventor based in Bigfork, Montana. He is known for his significant contributions to the field of semiconductor manufacturing, particularly in the area of chemical vapor deposition.
Latest Patents
Michael J Prucha holds a patent for a method of chemical vapor depositing a titanium nitride layer on a semiconductor wafer. This innovative process involves positioning a wafer within a chemical vapor deposition reactor, injecting gaseous TiCl4, NH3, and N2, and maintaining the reactor at specific pressure and temperature conditions. The method ensures the deposition of a uniform titanium nitride film on the wafer, which is crucial for enhancing the performance of semiconductor devices.
Career Highlights
Throughout his career, Michael has worked with Micron Technology Incorporated, a leading company in the semiconductor industry. His expertise in chemical vapor deposition has played a vital role in advancing the technology used in semiconductor fabrication.
Collaborations
Michael has collaborated with notable colleagues, including Ralph E Kauffman and James Beck, who have contributed to his work in the field of semiconductor technology.
Conclusion
Michael J Prucha's innovative methods in chemical vapor deposition have made a significant impact on the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.