San Jose, CA, United States of America

Michael J Mark


Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2015-2020

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2 patents (USPTO):Explore Patents

Title: Michael J Mark: Innovator in Semiconductor Processing

Introduction

Michael J Mark is a notable inventor based in San Jose, CA, who has made significant contributions to the field of semiconductor processing. With a total of 2 patents, he has developed innovative technologies that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of his latest patents is focused on measuring concentrations of radicals in semiconductor processing. This invention includes an apparatus that features a reactive species source, a spectral measurement volume, a light source, and a spectrometer. The apparatus is designed to control the light source and spectrometer to determine both environment and baseline spectra, allowing for the estimation of reactive species concentrations based on the net spectrum.

Another significant patent by Mark is an apparatus and method for controlling edge performance in an inductively coupled plasma chamber. This invention provides methods and apparatus for managing edge performance during processing. It includes a chamber body, a gas inlet for flowing process gas, and a supporting pedestal that controls the exposure of the substrate's edge region to the process gas.

Career Highlights

Michael J Mark is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing advanced technologies that improve semiconductor manufacturing processes.

Collaborations

Throughout his career, Mark has collaborated with notable colleagues such as Wei Liu and Johanes F Swenberg, contributing to the advancement of semiconductor technologies.

Conclusion

Michael J Mark's innovative patents and contributions to semiconductor processing highlight his role as a key inventor in the industry. His work continues to influence the development of efficient manufacturing techniques in semiconductor technology.

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