Michael J Hauser

Title: Michael J Hauser: Innovator in Integrated Circuit Protection

Introduction

Michael J Hauser is a notable inventor based in Albany, NY (US). He has made significant contributions to the field of integrated circuits, particularly in the area of process-induced damage protection structures. His innovative work has led to the development of a unique patent that addresses critical challenges in semiconductor technology.

Latest Patents

Hauser holds a patent for a "Fuse element for process-induced damage protection structure." This patent describes an integrated circuit (IC) structure that includes a transistor in a device layer over a substrate. The transistor features a gate and a plurality of interconnect layers, including a last metal layer. The PID protection structure incorporates a conductor that couples the gate to a well in the substrate, featuring an open fuse element. The design allows for the fuse element to be closed during fabrication, with metal interconnects enabling the opening of the fuse element to deactivate the PID protection structure after fabrication.

Career Highlights

Michael J Hauser is currently employed at GlobalFoundries U.S. Inc., where he continues to innovate in the semiconductor industry. His work focuses on enhancing the reliability and performance of integrated circuits, contributing to advancements in technology that impact various applications.

Collaborations

Hauser collaborates with fellow inventor Michael Joseph Zierak, working together to push the boundaries of integrated circuit design and protection mechanisms.

Conclusion

Michael J Hauser's contributions to the field of integrated circuits through his innovative patent demonstrate his commitment to advancing technology. His work at GlobalFoundries U.S. Inc. continues to influence the semiconductor industry positively.