Michael J Drury

Title: Michael J Drury: Innovator in Semiconductor Technology

Introduction

Michael J Drury is a notable inventor based in Fort Collins, Colorado. He has made significant contributions to the field of semiconductor technology, particularly in the area of contact formation and metallization patterns. His innovative approach has led to advancements that enhance the performance and reliability of electronic devices.

Latest Patents

Drury holds a patent titled "Use of selectively deposited tungsten for contact formation and shunting." This patent describes a process for utilizing selectively deposited tungsten in the creation of ohmic contacts and contact/interconnect metallization patterns. The process involves interconnecting fully formed field effect devices using contacts through a dielectric layer. A thin layer of intrinsic polysilicon or amorphous silicon is conformally deposited, patterned, and covered by selectively deposited tungsten. An anneal operation then forms self-aligned contacts or shunts, bridging the tungsten layer and the source/drain type diffusions exposed during the contact cut.

Career Highlights

Michael J Drury is currently associated with NCR Corporation, where he continues to apply his expertise in semiconductor technology. His work has been instrumental in developing processes that improve the efficiency and effectiveness of electronic components.

Collaborations

Throughout his career, Drury has collaborated with esteemed colleagues, including Werner A Metz, Jr and Nicholas J Szluk. These collaborations have fostered an environment of innovation and have contributed to the advancement of technology in their field.

Conclusion

Michael J Drury's contributions to semiconductor technology through his innovative patent and work at NCR Corporation highlight his role as a key figure in the industry. His advancements in contact formation and metallization patterns continue to influence the development of electronic devices.