This inventor holds 1 USPTO granted patent. Top assignee: Compax Corp.. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992
Title: Michael G Belanger: Innovator in Fabric Analysis Technology
Introduction
Michael G Belanger is an accomplished inventor based in Oak Park, IL (US). He has made significant contributions to the field of fabric analysis through his innovative patent. His work focuses on enhancing the understanding of fabric conditions, which is crucial for various textile applications.
Latest Patents
Belanger holds a patent for a "Method and apparatus for analyzing fabric conditions." This invention provides a system for analyzing both knitted and woven fabrics, particularly for in-process analysis of stitch count or yarn count. The system utilizes a camera positioned over the fabric, which is exposed by a high-speed strobe to create a freeze-frame image. This image is then digitized and stored for computer processing. An early processing step involves scanning the image along multiple angularly displaced scanning axes to determine the construction line of the fabric. This technique allows for a more precise analysis while achieving color insensitivity without the need for expensive infra-red strobe devices.
Career Highlights
Belanger is associated with Compax Corp., where he applies his expertise in fabric analysis technology. His innovative approach has positioned him as a key figure in the development of advanced textile analysis systems.
Collaborations
Belanger collaborates with Rick L Hudson, contributing to the advancement of fabric analysis technologies. Their combined efforts enhance the capabilities of the systems developed at Compax Corp.
Conclusion
Michael G Belanger's contributions to fabric analysis technology demonstrate his innovative spirit and commitment to improving textile applications. His patent reflects a significant advancement in the field, showcasing the importance of precise fabric analysis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile