This inventor holds 1 USPTO granted patent. Top assignees: Az Electronic Materials USA Corp., Infineon Technologies Ag. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 115 
1 out of 15,036 
Years Active: 2007
Title: Michael Francis Houlihan - Innovator in Photolithography
Introduction
Michael Francis Houlihan, based in Millington, NJ, is a distinguished inventor recognized for his contributions to the field of photolithography. With a notable patent under his belt, Houlihan has made a significant impact in the semiconductor industry.
Latest Patents
Houlihan holds one patent for a photoresist suitable for use in 157 nm photolithography. This innovative photoresist includes a polymer based on fluorinated norbornene derivatives, which enhances its efficacy and reliability in advanced lithographic processes.
Career Highlights
Throughout his career, Houlihan has worked with several prominent companies in the semiconductor field, including Infineon Technologies AG and AZ Electronic Materials USA Corp. His experience at these organizations has provided him with a solid foundation in materials science and semiconductor technology.
Collaborations
During his career, Houlihan collaborated with notable peers such as Christoph Hohle and Ralph R. Dammel. These collaborations have fostered innovation and have led to advancements in photolithography techniques.
Conclusion
Michael Francis Houlihan's contributions to photolithography through his patented innovations signify his role as a forward-thinking inventor. His work continues to influence the semiconductor industry, showcasing the importance of innovation in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile