Millington, NJ, United States of America

Michael Francis Houlihan


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Michael Francis Houlihan - Innovator in Photolithography

Introduction

Michael Francis Houlihan, based in Millington, NJ, is a distinguished inventor recognized for his contributions to the field of photolithography. With a notable patent under his belt, Houlihan has made a significant impact in the semiconductor industry.

Latest Patents

Houlihan holds one patent for a photoresist suitable for use in 157 nm photolithography. This innovative photoresist includes a polymer based on fluorinated norbornene derivatives, which enhances its efficacy and reliability in advanced lithographic processes.

Career Highlights

Throughout his career, Houlihan has worked with several prominent companies in the semiconductor field, including Infineon Technologies AG and AZ Electronic Materials USA Corp. His experience at these organizations has provided him with a solid foundation in materials science and semiconductor technology.

Collaborations

During his career, Houlihan collaborated with notable peers such as Christoph Hohle and Ralph R. Dammel. These collaborations have fostered innovation and have led to advancements in photolithography techniques.

Conclusion

Michael Francis Houlihan's contributions to photolithography through his patented innovations signify his role as a forward-thinking inventor. His work continues to influence the semiconductor industry, showcasing the importance of innovation in advancing technology.

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