Coon Rapids, MN, United States of America

Michael F Reed

This inventor holds 1 USPTO granted patent. Top assignee: Multi-Arc Vacuum Systems Inc.. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael F Reed. Retrieved from https://idiyas.com/inventor/michael-f-reed-ul709dji

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Michael F Reed - Innovator in Physical Vapor Deposition Technology

Introduction

Michael F Reed is a notable inventor based in Coon Rapids, MN (US). He has made significant contributions to the field of physical vapor deposition technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency and effectiveness of vapor deposition processes.

Latest Patents

Michael F Reed holds 1 patent for his invention titled "Physical vapor deposition apparatus." This patent describes an improved electric arc vapor deposition source plate mounting assembly. The assembly is designed with multiple cooperatively mating sections that are secured together by fastening members. The innermost section carries an electrode of coating source material, while insulator seal rings electrically isolate the sections and form a vacuum seal. The design includes features that enhance sealing characteristics and protect the assembly from contamination and damage.

Career Highlights

Throughout his career, Michael has been associated with Multi-Arc Vacuum Systems Inc., where he has applied his expertise in developing advanced vapor deposition technologies. His work has been instrumental in improving the performance and reliability of vapor deposition systems.

Collaborations

Michael has collaborated with notable colleagues, including Clark Bergman and Gary E Vergason. These partnerships have contributed to the advancement of technology in the field of physical vapor deposition.

Conclusion

Michael F Reed's innovative contributions to physical vapor deposition technology demonstrate his commitment to advancing engineering solutions. His patent reflects a significant step forward in the efficiency of vapor deposition processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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