Location History:
- Albuquerque, NM (US) (2002 - 2006)
- Bend, OR (US) (2006)
Company Filing History:
Years Active: 2002-2006
Title: **Michael E Littau: Innovator in Lithographic Technology**
Introduction
Michael E Littau, based in Albuquerque, NM, has made significant contributions to the field of lithographic technology through his inventive prowess. With a total of four patents to his name, Littau's work focuses on advancing the methods used in determining the center of focus in lithography, which is crucial for precision in semiconductor manufacturing.
Latest Patents
Littau's latest innovations include two notable patents:
1. **Determination of center of focus by parameter variability analysis** - This patent presents methods for determining the center of focus and process control for a lithographic tool. It involves obtaining diffraction signatures from various diffraction structures across multiple focus setting fields. The variability of these signatures is analyzed to monitor focus drift and ensure process control, utilizing measures such as standard deviation or intensity range.
2. **Determination of center of focus by cross-section analysis** - This method involves cross-section analysis of scatterometry models to determine parameters in lithographic devices. It provides control methods for managing the center of focus in lithography applications, further enhancing the accuracy and reliability of these crucial devices.
Career Highlights
Michael E Littau is affiliated with Accent Optical Technologies, Inc., where he utilizes his expertise in optics and lithography to develop innovative solutions. His progressive work at this company has helped in the evolution of techniques essential for the semiconductor industry, emphasizing his role as a key figure in technological advancement.
Collaborations
In his endeavors, Littau collaborates closely with Christopher J Raymond, leveraging their combined expertise to push the boundaries of lithographic technology. Their teamwork exemplifies the synergy of innovative minds working together in the pursuit of excellence in their field.
Conclusion
As an inventor, Michael E Littau stands out for his contributions to lithographic processes essential in the semiconductor manufacturing industry. His patents serve as a testament to his innovative spirit and dedication to enhancing the precision and efficiency of lithographic tools. Through his work at Accent Optical Technologies, Inc., Littau continues to make strides that influence the landscape of technology and drive future innovations.