The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Oct. 10, 2002
Applicants:
Michael E. Littau, Albuquerque, NM (US);
Christopher J. Raymond, Albuquerque, NM (US);
Inventors:
Michael E. Littau, Albuquerque, NM (US);
Christopher J. Raymond, Albuquerque, NM (US);
Assignee:
Accent Optical Technologies, Inc., Bend, OR (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for determination of parameters in lithographic devices and applications by cross-section analysis of scatterometry models, including determination of center of focus in lithography devices and applications. Control methods are provided for process control of center of focus in lithography devices utilizing cross-section analysis.