The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Jul. 23, 2002
Applicant:
Inventors:
Michael E. Littau, Albuquerque, NM (US);
Christopher J. Raymond, Albuquerque, NM (US);
Assignee:
Accent Optical Technologies, Inc., Bend, OR (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/00 ;
U.S. Cl.
CPC ...
G01B 9/00 ;
Abstract
Methods for determination of parameters in lithographic devices and applications by diffraction signature difference analysis, including determination of center of focus in lithography devices and applications. Latent image analysis may be employed with exposed but undeveloped lithographic substrates. Control methods are provided for process control of center of focus in lithography devices utilizing diffraction signature difference analysis.