Company Filing History:
Years Active: 2011
Title: Michael D Messina, Jr: Innovator in Nano-Lithography
Introduction
Michael D Messina, Jr. is a prominent inventor based in Southport, CT (US). He has made significant contributions to the field of nano-lithography, holding 2 patents that showcase his innovative approach to photolithographic technology.
Latest Patents
His latest patents include a "Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography." This invention features a nanophotolithography mask that consists of a layer of electrically conductive optically opaque material deposited on a mask substrate, where regular arrays of sub-wavelength apertures are formed. The plasmonic excitation in this layer, when exposed to light, produces high-resolution far-field radiation patterns that can effectively expose a photoresist on a wafer. This technology significantly enhances mask manufacturing throughput and demonstrates defect resiliency, allowing for the imprinting of coherent features at nano dimensions for integrated circuit design.
Another notable patent is the "Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays." This stepper system employs a similar photolithographic mask and is designed to produce high-resolution patterns on wafers. The system is capable of adjusting to image the plane of the highest plasmonic field exiting the mask, further enhancing its effectiveness in integrated circuit design.
Career Highlights
Michael D Messina, Jr. is affiliated with the University System of Maryland, where he continues to advance research in the field of nano-lithography. His work has positioned him as a key figure in the development of technologies that push the boundaries of integrated circuit manufacturing.
Collaborations
He has collaborated with notable colleagues such as Martin C Peckerar and Mario Dagenais, contributing to the advancement of innovative solutions in photolithography.
Conclusion
Michael D Messina, Jr. is a distinguished inventor whose work in nano-lithography has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence in technology development.
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