Company Filing History:
Years Active: 2003-2014
Title: The Innovations of Michael D. Hulvey
Introduction
Michael D. Hulvey is a prominent inventor based in Shelburne, VT (US). He has made significant contributions to the field of integrated circuits, holding a total of 7 patents. His work focuses on methods that enhance the performance and reliability of electronic devices.
Latest Patents
One of his latest patents is a method for compensating for variations in structures of an integrated circuit. This innovative method includes several steps: (a) selecting a mask design shape and a region of the mask design shape; (b) applying a model-based optical proximity correction to the entire mask design shape; and after that, (c) applying a rules-based optical proximity correction to the selected region of the mask design shape. This approach aims to improve the accuracy and efficiency of integrated circuit manufacturing.
Career Highlights
Michael D. Hulvey has had a distinguished career, working at International Business Machines Corporation (IBM). His expertise in integrated circuits has positioned him as a key player in the development of advanced technologies. His contributions have not only advanced the field but have also paved the way for future innovations.
Collaborations
Throughout his career, Michael has collaborated with notable colleagues, including Stephen Arthur St Onge and Santo Credendino. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Michael D. Hulvey's work in the field of integrated circuits exemplifies the spirit of innovation. His patents and collaborations reflect a commitment to advancing technology and improving electronic devices. His contributions will undoubtedly continue to influence the industry for years to come.