The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Sep. 11, 2008
Santo Credendino, Raleigh, NC (US);
Michael D. Hulvey, Shelburne, VT (US);
Jothimalar Kuppusamy, Chennai, IN;
Robert Kenneth Leidy, Burlington, VT (US);
Paul William Pastel, Essex, VT (US);
Bruce Walter Porth, Jericho, VT (US);
Anthony K. Stamper, Williston, VT (US);
Santo Credendino, Raleigh, NC (US);
Michael D. Hulvey, Shelburne, VT (US);
Jothimalar Kuppusamy, Chennai, IN;
Robert Kenneth Leidy, Burlington, VT (US);
Paul William Pastel, Essex, VT (US);
Bruce Walter Porth, Jericho, VT (US);
Anthony K. Stamper, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.