Company Filing History:
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Years Active: 1995-2003
Title: Michael D Evans: Innovator in Electroless Metal Deposition
Introduction
Michael D Evans is a notable inventor based in Wilmington, MA (US), recognized for his contributions to the field of electroless metal deposition. With a total of 3 patents to his name, Evans has made significant strides in developing processes that enhance the metalization of substrates.
Latest Patents
One of Evans' latest patents is a process for the electroless deposition of metal on a substrate. This innovative method allows for the metal to either coat the entire substrate or be deposited in a pattern on the substrate surface. The process involves forming a pattern of resist material on the substrate, which defines the areas for metal deposition. The substrate is treated with specific reagents that promote electroless plating, followed by heating to ensure proper adhesion and formation of additional metal layers. Another significant patent is a method of forming vias, which includes creating an opening in a substrate and heating it to recombine the slag with the substrate.
Career Highlights
Throughout his career, Michael D Evans has worked with prominent companies such as AT&T Corp. and Lucent Technologies Inc. His experience in these organizations has contributed to his expertise in the field of metal deposition technologies.
Collaborations
Evans has collaborated with notable colleagues, including Tae Yong Kim and Richard P Debiec, who have also contributed to advancements in related technologies.
Conclusion
Michael D Evans stands out as an innovative inventor in the realm of electroless metal deposition, with a focus on enhancing substrate metalization processes. His patents and career achievements reflect his commitment to advancing technology in this field.