Michael Cipollo

Title: Michael Cipollo: Innovator in Plasma Cleaning Technology

Introduction

Michael Cipollo is an accomplished inventor based in East Greenbush, NY (US). He has made significant contributions to the field of plasma cleaning technology, particularly with his innovative approach to cleaning cylindrical surfaces. His work has implications for various industries that require precise surface preparation.

Latest Patents

Cipollo holds a patent for an "In-situ plasma cleaning device for cylindrical surfaces." This device performs an atomic surface cleaning process designed to remove contaminants and modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the device, allowing for effective cleaning of both surfaces either concurrently or separately. Additionally, the device is engineered to traverse the length of the target and substrate cylindrical surfaces during the cleaning process. He has 1 patent to his name.

Career Highlights

Michael Cipollo has dedicated his career to advancing technologies that enhance surface cleaning processes. His work with the USA As Represented by Secretary of the Navy showcases his commitment to innovation and excellence in engineering. His contributions have been recognized within the industry, and he continues to push the boundaries of what is possible in plasma cleaning technology.

Collaborations

Cipollo has collaborated with notable colleagues, including Michael J Audino and David A Glocker. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the development of innovative solutions in their field.

Conclusion

Michael Cipollo's work in the development of in-situ plasma cleaning devices represents a significant advancement in surface cleaning technology. His innovative approach and dedication to his craft continue to influence the industry positively.