The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2008
Filed:
Sep. 30, 2003
Michael J. Audino, Albany, NY (US);
Michael Cipollo, East Greenbush, NY (US);
David Glocker, West Henrietta, NY (US);
Kevin Miner, Castleton, NY (US);
Patrick Vottis, Schnectady, NY (US);
Michael J. Audino, Albany, NY (US);
Michael Cipollo, East Greenbush, NY (US);
David Glocker, West Henrietta, NY (US);
Kevin Miner, Castleton, NY (US);
Patrick Vottis, Schnectady, NY (US);
United States of America as represented by the Secrertary of the Army, Washington, DC (US);
Abstract
An in-situ plasma cleaning device (PCD) performs an atomic surface cleaning process to remove contaminants and/or to modify the cylindrical surfaces of both the target and substrate. The atomic cleaning process utilizes a plasma generated locally within the in-situ plasma cleaning device with suitable properties to clean both the target and substrate cylindrical surfaces either concurrently or separately. Moreover, the in-situ plasma cleaning device is designed to traverse the length of the target and the substrate cylindrical surfaces during the cleaning process.