Michael A McNeilly

Title: Michael A McNeilly: Innovator in Semiconductor Technology

Introduction

Michael A McNeilly is a prominent inventor based in Palo Alto, CA, known for his significant contributions to semiconductor technology. With a total of 7 patents to his name, McNeilly has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, McNeilly has introduced an "Organic preclean for improving vapor phase wafer etch uniformity." This method focuses on achieving greater uniformity and control in vapor phase etching of silicon and silicon oxide layers. The process involves cleaning the wafer surface to remove organics before proceeding with vapor phase etching. Additionally, an integrated apparatus for cleaning and etching is described, which includes cooling steps to increase throughput and an on-demand vaporizer for precise vapor supply. Another notable patent is the "Method of selective etching native oxide," which details a technique for selectively etching native oxide on a substrate using hydrogen halide vapor and water vapor. This method ensures that native oxide is removed without significantly affecting other oxides.

Career Highlights

Throughout his career, McNeilly has worked with several companies, including Advantage Production Technology, Inc. and Genus, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

McNeilly has collaborated with notable professionals in the field, including Dah-Bin Kao and Bruce E Deal. These collaborations have further enriched his work and led to innovative solutions in semiconductor manufacturing.

Conclusion

Michael A McNeilly's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the industry and improve manufacturing processes.