The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1988
Filed:
Oct. 15, 1986
Applicant:
Inventor:
Michael A McNeilly, Palo Alto, CA (US);
Assignee:
Advantage Production Technology, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B / ; C30B / ; F24H / ; H05B / ;
U.S. Cl.
CPC ...
156612 ; 156613 ; 118725 ; 118728 ; 118500 ; 219385 ; 219399 ; 219430 ; 219439 ; 219462 ; 219521 ; 219530 ; 219540 ;
Abstract
A reaction system and process for uniformly heating semiconductor substrates and a device for supporting the same and direct conductive heating of IC wafers within a reactor are described. The substrate is held in direct contact with the heating source positioned within the reactor. The heat source is a thermal delivery module made of material such as solid silicon carbide, or high temperature material containing resistive heating elements. The heat is uniformly transferred to the walls of the module by a molten metal having a low melting point and high boiling point such as essentially indium or bismuth or a eutectic of indium and bismuth.