Hutchinson, MN, United States of America

Michael A Cisewski

USPTO Granted Patents = 4 


Average Co-Inventor Count = 8.9

ph-index = 4

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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4 patents (USPTO):

Title: Innovations of Michael A. Cisewski

Introduction

Michael A. Cisewski is an accomplished inventor based in Hutchinson, MN (US). He holds a total of four patents, showcasing his expertise in developing innovative solutions in the field of liquid dispensing systems and containment technologies. His work has significantly contributed to advancements in material delivery systems.

Latest Patents

Cisewski's latest patents include a liquid dispensing system that encompasses gas removal. This system is designed for the delivery of various materials where liquid and gas or vapor states are present simultaneously. It features a pressure dispensing package that removes headspace gas prior to liquid dispensation, ensuring a more efficient operation. Additionally, he has developed a reticle pod, which consists of a dual containment structure that provides environmental control and support for sensitive materials. This pod design includes a gap that prevents contamination, thereby protecting the integrity of the wafer or reticle.

Career Highlights

Throughout his career, Michael A. Cisewski has worked with notable companies such as Advanced Technology Materials, Inc. and Entegris, Inc. His experience in these organizations has allowed him to refine his skills and contribute to significant technological advancements.

Collaborations

Cisewski has collaborated with esteemed colleagues, including Donald D. Ware and Glenn M. Tom. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Michael A. Cisewski's contributions to the field of liquid dispensing systems and containment technologies highlight his innovative spirit and dedication to advancing material delivery solutions. His patents reflect a commitment to improving efficiency and reducing contamination in sensitive applications.

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