The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2013

Filed:

Jul. 30, 2012
Applicants:

Steven Kolbow, Chaska, MN (US);

Kevin Mcmullen, Shorewood, MN (US);

Anthony M. Tieben, Jordan, MN (US);

Matthew Kusz, Minneapolis, MN (US);

Christian Andersen, Carver, MN (US);

Huaping Wang, Eden Prairie, MN (US);

Michael Cisewski, Hutchinson, MN (US);

Michael L. Johnson, Minneapolis, MN (US);

David L. Halbmaier, Shorewood, MN (US);

John Lystad, Bloomington, MN (US);

Inventors:

Steven Kolbow, Chaska, MN (US);

Kevin McMullen, Shorewood, MN (US);

Anthony M. Tieben, Jordan, MN (US);

Matthew Kusz, Minneapolis, MN (US);

Christian Andersen, Carver, MN (US);

Huaping Wang, Eden Prairie, MN (US);

Michael Cisewski, Hutchinson, MN (US);

Michael L. Johnson, Minneapolis, MN (US);

David L. Halbmaier, Shorewood, MN (US);

John Lystad, Bloomington, MN (US);

Assignee:

Entegris, Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65D 85/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.


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