Micah LeDoux

Title: Innovations of Micah LeDoux

Introduction

Micah LeDoux is an accomplished inventor based in Beaverton, OR (US). She has made significant contributions to the field of sample preparation technology, particularly through her innovative use of ion beam technology. With a total of 3 patents to her name, her work has advanced the capabilities of multilayer sample processing.

Latest Patents

One of her latest patents is focused on perimeter trench formation and delineation etch delayering. This patent discloses apparatus and methods suitable for both online and offline use with multilayer samples. The technology leverages ion beam technology to provide rapid and accurate delayering with etch stops at a succession of target layers. In this process, a trench is milled around a region of interest (ROI), and a conductive coating is developed on the inner sidewall. This innovation ensures reliable conducting paths between intermediate layers within the ROI and a base layer, while eliminating stray current paths extending outside the ROI. As a result, better quality etch progress monitoring is achieved during subsequent etching from body or scattered currents. Additionally, ion beam assisted gas etching allows for rapid delayering with etch stops at target polysilicon layers, enabling uniform etching at deep layers.

Career Highlights

Micah LeDoux is currently employed at FEI Company, where she continues to push the boundaries of technology in her field. Her work has been instrumental in enhancing the efficiency and accuracy of sample preparation processes.

Collaborations

Micah has collaborated with notable colleagues, including James S Clarke and Jason Lee Monfort, contributing to a dynamic and innovative work environment.

Conclusion

Micah LeDoux's contributions to the field of sample preparation through her patents and innovative techniques highlight her role as a leading inventor. Her work continues to influence advancements in technology and improve processes in multilayer sample analysis.