Company Filing History:
Years Active: 2010
Title: Mi-Joung Lee: Innovator in Semiconductor Technology
Introduction
Mi-Joung Lee is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to defect detection in semiconductor devices.
Latest Patents
One of his latest patents is a monitoring pattern for detecting a defect in a semiconductor device and a method for detecting a defect. This monitoring pattern allows for voltage contrast inspection, which can be verified by an electrical test without requiring a special test pattern. The design includes a test pattern with line shapes arranged in parallel and spaced apart at predetermined linewidths and intervals. An interconnection layer connects to the test pattern, which is adapted to be charged with a specific potential to display a voltage contrast image when scanned with an electron beam.
Another notable patent is a test pattern and method of monitoring defects using the same. This test pattern consists of a normal pattern, an abnormal pattern with predetermined defects, and a conductive line that is electrically connected to the normal pattern while being electrically isolated from the abnormal pattern. This design allows for compatibility between non-contact and contact test processes using a single test pattern.
Career Highlights
Mi-Joung Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the reliability and efficiency of semiconductor devices.
Collaborations
He has collaborated with notable colleagues such as Choel-Hwyi Bae and Yong-woon Han, contributing to a dynamic and innovative work environment.
Conclusion
Mi-Joung Lee's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence in the field. His work not only advances technology but also sets a standard for future developments in defect detection methods.