Mi Jeong Lim

Title: Mi Jeong Lim – Innovator in Reflective Mask Technology

Introduction

Mi Jeong Lim is a talented inventor based in Seoul, South Korea, known for his contributions to the field of reflective mask technology. His innovation holds significant potential for advancements in various optical applications.

Latest Patents

Lim has been granted one patent for his invention titled "Reflective Mask and Method of Fabricating the Same." This innovative reflective mask comprises a first reflection layer situated on a mask substrate, along with a first capping layer on the reflection layer. It features a second reflection pattern on part of the capping layer and a phase shifter positioned between the second reflection pattern and the first capping layer. This design effectively creates a phase difference between the first light reflecting from the first reflection layer and the second light reflecting from the second pattern, thus enhancing optical performance.

Career Highlights

Mi Jeong Lim is currently employed at SK Hynix Inc., a leading global semiconductor manufacturer, where he continues to advance his research in reflective technologies. His work at the company has positioned him at the forefront of innovation within the semiconductor field.

Collaborations

Lim collaborates closely with his colleagues, including In Hwan Lee and Sun Young Koo. Their collective efforts contribute to the continuous development and refinement of technologies that facilitate advancements in optical engineering.

Conclusion

Mi Jeong Lim's inventive spirit and commitment to innovation underscore his significant role in shaping the future of reflective mask technologies. As he continues to build upon his achievements at SK Hynix Inc., his contributions are poised to impact various sectors within the industry.