The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Jun. 10, 2015
SK Hynix Inc., Gyeonggi-do, KR;
In Hwan Lee, Seoul, KR;
Sun Young Koo, Gyeonggi-do, KR;
Seo Min Kim, Seoul, KR;
Yong Dae Kim, Chungcheongbuk-do, KR;
Jin Soo Kim, Seoul, KR;
Byung Hoon Lee, Gyeonggi-do, KR;
Mi Jeong Lim, Seoul, KR;
Chang Moon Lim, Seoul, KR;
Tae Joong Ha, Daejeon, KR;
Yoon Suk Hyun, Gyeonggi-do, KR;
SK Hynix Inc., Gyeonggi-do, KR;
Abstract
A reflective mask includes a first reflection layer disposed on a mask substrate, a first capping layer disposed on the first reflection layer, a second reflection pattern disposed on a portion of the first capping layer, and a phase shifter disposed between the second reflection pattern and the first capping layer to cause a phase difference between a first light reflecting from the first reflection layer and a second light reflecting from the second reflection pattern. Related methods are also provided.