Company Filing History:
Years Active: 2014-2015
Title: Innovations of Meng-Fan Wu
Introduction
Meng-Fan Wu is a notable inventor based in Keelung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his expertise and innovative spirit. His work primarily focuses on enhancing the efficiency and effectiveness of integrated circuit design and manufacturing processes.
Latest Patents
Meng-Fan Wu's latest patents include "Systems and methods for tuning technology files" and "Flexible pattern-oriented 3D profile for advanced process nodes." The first patent describes a method that involves arranging various layer combinations into groups, performing shifting analysis on benchmark circuits, and calculating tuning vector values based on criteria vectors. This process allows for the regeneration of technology files, such as a 2.5-dimensional RC techfile. The second patent presents a method for RC extraction that emphasizes fast development time and easy maintenance. It includes a graphical representation of an integrated chip layout and defines structural aspects of integrated chip components through pattern-based graphical features.
Career Highlights
Meng-Fan Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves leveraging his innovative ideas to improve semiconductor processes and technologies. His contributions have been instrumental in advancing the capabilities of integrated circuits.
Collaborations
Throughout his career, Meng-Fan Wu has collaborated with talented individuals such as Ke-Ying Su and Chia-Ming Ho. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Meng-Fan Wu's work exemplifies the spirit of innovation in the semiconductor industry. His patents reflect a commitment to improving technology and enhancing the design of integrated circuits. His contributions continue to influence the field and inspire future advancements.