Pasadena, CA, United States of America

Melissa Ziebell

This inventor holds 1 USPTO granted patent. Top assignee: Rockley Photonics Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Melissa Ziebell. Retrieved from https://idiyas.com/inventor/melissa-ziebell-pu1u2rel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Melissa Ziebell

Introduction

Melissa Ziebell is a notable inventor based in Pasadena, California. She has made significant contributions to the field of technology, particularly in alignment systems. With one patent to her name, she exemplifies the spirit of innovation that drives advancements in various industries.

Latest Patents

Melissa Ziebell holds a patent for a "System and method for measuring alignment." This invention provides a method for measuring offsets between alignment marks on a source die and a target wafer. The method includes measuring a first offset along a direction that is substantially parallel to the edge of the source die. This technology has the potential to enhance precision in manufacturing processes.

Career Highlights

Ziebell is currently employed at Rockley Photonics Limited, a company known for its cutting-edge developments in photonics technology. Her work at Rockley Photonics highlights her commitment to advancing the field and contributing to innovative solutions.

Collaborations

Throughout her career, Melissa has collaborated with talented individuals such as Chia-Te Chou and Albert Benzoni. These collaborations have likely enriched her work and contributed to the success of her projects.

Conclusion

Melissa Ziebell's contributions to the field of technology through her innovative patent demonstrate her role as a significant inventor. Her work continues to influence advancements in alignment systems, showcasing the importance of innovation in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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