The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Dec. 17, 2021
Applicant:

Rockley Photonics Limited, Cheshire, GB;

Inventors:

Chia-Te Chou, Brea, CA (US);

Albert Benzoni, South Pasadena, CA (US);

Michael Lee, Los Angeles, CA (US);

Cristian Stagarescu, Los Angeles, CA (US);

William Vis, Pasadena, CA (US);

Melissa Ziebell, Pasadena, CA (US);

Assignee:

Rockley Photonics Limited, Altrincham, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/42 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
G02B 6/4224 (2013.01); H01L 23/544 (2013.01);
Abstract

A system and method for alignment. In some embodiments, the method includes measuring a first offset, the first offset being an offset along a first direction between a first alignment mark and a second alignment mark, the first alignment mark being an alignment mark on a first edge of a source die, the second alignment mark being an alignment mark on a target wafer, and the first direction being substantially parallel to the first edge of the source die.


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