Chicago, IL, United States of America

Meko McCray


Average Co-Inventor Count = 7.3

ph-index = 1


Company Filing History:


Years Active: 2015-2017

Loading Chart...
3 patents (USPTO):Explore Patents

Title: **The Innovative Journey of Meko McCray**

Introduction

Meko McCray, an accomplished inventor based in Chicago, IL, has made significant contributions in the field of photopatternable materials and related electronic devices. With a total of three patents to his name, McCray's work demonstrates a commitment to advancing technology through innovative materials.

Latest Patents

Meko McCray's latest patents focus on developing unique polymeric materials that can be patterned with low photo-exposure energies while maintaining thermal stability and mechanical robustness. His inventions are designed to resist water penetration and exhibit excellent adhesion to various substrates, including metals and organic materials. The first patent details a solution-processable composition for preparing a photopatternable material, which includes an oligomeric siloxane component with cage-structured polyhedral oligomeric silsesquioxanes and crosslinkable moieties. The second patent emphasizes the solution-processing capabilities of these materials, highlighting their significant chemical resistance when cured.

Career Highlights

Throughout his career, McCray has worked with esteemed companies in the industry, including Polyera Corporation and Flexterra, Inc. His role in these organizations allowed him to enhance his expertise in the field of materials science, focusing on the development of innovative solutions that can be practically applied in electronics.

Collaborations

Meko McCray has collaborated with talented individuals such as Chun Huang and Yu Xia, fostering a dynamic environment that blends diverse ideas and expertise to innovate and push the boundaries of materials science. These collaborations have likely contributed to the richness and depth of his research, leading to successful patent applications.

Conclusion

Meko McCray's innovative spirit and dedication to research have resulted in valuable contributions to the field of photopatternable materials. His work not only showcases his inventiveness but also underscores the importance of collaboration in driving forward technological advancements. With ongoing developments, McCray continues to pave the way for future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…