The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2016
Filed:
Aug. 25, 2014
Polyera Corporation, Skokie, IL (US);
Chun Huang, Arlington Heights, IL (US);
Zhikai Wang, Roswell, GA (US);
Yu Xia, Northbrook, IL (US);
Meko McCray, Chicago, IL (US);
Theresa L. Starck, Chicago, IL (US);
Darwin Scott Bull, Mundelein, IL (US);
Antonio Facchetti, Chicago, IL (US);
Xiang Yu, Skokie, IL (US);
Polyera Corporation, Skokie, IL (US);
Abstract
Described herein is a solution-processable composition for preparing a photopatternable material. The solution-processable composition generally includes (a) an oligomeric siloxane component that includes, based on its total weight, between about 40% by weight and about 100% by weight one or more cage-structured polyhedral oligomeric silsesquioxanes that are functionalized with one or more crosslinkable moieties such as cycloaliphatic epoxy moieties, (b) a polymerization initiator; (c) one or more thermosettable polymers that collectively are present in an amount between about 1% by weight and about 20% by weight based on the total weight of the oligomeric siloxane component; and (d) a solvent.