Meiki Koh

Title: Meiki Koh: Innovator in Dry-Etching Technology

Introduction

Meiki Koh is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative dry-etching method. His work has implications for the efficiency and precision of wafer processing in the electronics industry.

Latest Patents

Meiki Koh holds 1 patent for his dry-etching method. This method utilizes an apparatus where a wafer is placed on either of a pair of opposed electrodes within an etching chamber. High-frequency power is supplied to both electrodes to facilitate plasma etching. The process employs a gas mixture containing at least Cl and HBr, allowing for the formation of trenches in silicon wafers through a mask layer, such as a nitride silicon layer. By adjusting the high-frequency power supplied to the electrode where the wafer is placed, Koh can control the shape of the trench sidewalls, enabling the creation of trenches with desired shapes, even when their widths vary.

Career Highlights

Meiki Koh is associated with Tokyo Electron Limited, a leading company in the semiconductor equipment industry. His work at this organization has allowed him to contribute to advancements in etching technologies that are crucial for modern electronics.

Collaborations

One of his notable coworkers is Etsuo Iijima, with whom he has likely collaborated on various projects within the realm of semiconductor technology.

Conclusion

Meiki Koh's innovative dry-etching method represents a significant advancement in semiconductor processing. His contributions continue to influence the efficiency and precision of wafer fabrication in the electronics industry.