Mei Po Yeung

Title: Mei Po Yeung: Innovator in Substrate Support Technology

Introduction

Mei Po Yeung is a distinguished inventor based in San Jose, CA (US). She has made significant contributions to the field of substrate support technology, particularly in plasma etch operations. Her innovative approach has led to the development of a unique patent that enhances processing efficiency in various applications.

Latest Patents

Mei Po Yeung holds a patent for a "Substrate support for plasma etch operations." This patent describes methods and apparatus for processing substrates, which include a dielectric insulator plate and a conductive plate. The conductive plate features a tapered edge portion that enhances its functionality. Additionally, a dielectric plate is incorporated, which provides a substrate support surface on the conductive plate's top surface. This invention is crucial for improving the performance of processing chambers.

Career Highlights

Throughout her career, Mei Po Yeung has been associated with Applied Materials, Inc., a leading company in the semiconductor industry. Her work has focused on advancing technologies that support the manufacturing processes of semiconductors. With her expertise, she has contributed to the development of innovative solutions that address industry challenges.

Collaborations

Mei Po Yeung has collaborated with notable colleagues, including Larry Frazier and Cheng-Hsiung Matthew Tsai. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Mei Po Yeung is a remarkable inventor whose work in substrate support technology has made a significant impact in the semiconductor industry. Her innovative patent and collaborations with esteemed colleagues highlight her contributions to advancing technology.