This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2021-2023.
Company Filing History:
Years Active: 2021-2023
Title: Innovations of Mei Lee in Particle Detection Technology
Introduction
Mei Lee is an accomplished inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of particle detection technology, holding a total of 2 patents. His work focuses on methods for processing substrates using advanced fluid dynamics to detect nano-particles.
Latest Patents
Mei Lee's latest patents include a method for processing a substrate by using fluid flowing through a particle detector. This innovative method utilizes a particle detector to identify nano-particles contained in fluid. The particle detector features a substrate with nano-pores, where the pore size exceeds the particle size of the nano-particles, allowing for effective detection. Additionally, he has developed a particle detector that includes a substrate and at least one pair of sensing electrodes. This design also incorporates nano-pores, facilitating the passage of nano-particles through the substrate.
Career Highlights
Mei Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to further his research and development in particle detection technologies.
Collaborations
Some of Mei Lee's notable coworkers include Chwen Yu and Shu-Yu Hsu, who contribute to the innovative environment at their workplace.
Conclusion
Mei Lee's contributions to particle detection technology demonstrate his expertise and commitment to innovation. His patents reflect a deep understanding of fluid dynamics and nano-technology, positioning him as a key figure in his field.