Company Filing History:
Years Active: 2013
Title: Mei-Fang Shen: Innovator in Optical Proximity Correction
Introduction
Mei-Fang Shen is a notable inventor based in Chupei, Taiwan. She has made significant contributions to the field of optical proximity correction (OPC), particularly through her innovative techniques for determining edge fragment correlation information.
Latest Patents
Mei-Fang Shen holds a patent titled "Edge fragment correlation determination for optical proximity correction." This invention relates to techniques for determining edge fragment correlation information. Various implementations of the invention allow for the determination of image intensity slope information for edge fragments in a layout design. This information describes how image intensity for each of the edge fragments changes with its position. Additionally, image amplitude sensitivity information for the edge fragments is determined, which describes how image amplitude for each of the edge fragments changes with the positions of neighboring edge fragments. Based on both the image intensity slope information and the image amplitude sensitivity information, edge fragment correlation information is established. This correlation information can be utilized to process the layout design using OPC techniques, either on the entire layout or on problematic regions identified by conventional OPC processes. Mei-Fang Shen has 1 patent to her name.
Career Highlights
Mei-Fang Shen is currently employed at Mentor Graphics Corporation, where she continues to advance her research and development in optical proximity correction technologies. Her work has been instrumental in enhancing the accuracy and efficiency of layout designs in the semiconductor industry.
Collaborations
Some of her coworkers include Junjiang Lei and Le Hong, who contribute to the collaborative efforts in their projects at Mentor Graphics Corporation.
Conclusion
Mei-Fang Shen's innovative work in optical proximity correction exemplifies the impact of her research on the semiconductor industry. Her contributions continue to shape the future of layout design technologies.