Yamanashi, Japan

Megumi Kurihara

This inventor holds 1 USPTO granted patent. Top assignee: Tri Chemical Laboratory Inc.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Megumi Kurihara. Retrieved from https://idiyas.com/inventor/megumi-kurihara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Megumi Kurihara: Innovator in Chemical Vapor Deposition

Introduction

Megumi Kurihara is a prominent inventor based in Yamanashi, Japan. She has made significant contributions to the field of chemical vapor deposition (CVD). Her innovative approaches have paved the way for advancements in materials science.

Latest Patents

Kurihara holds a patent for "Processes for the chemical vapor deposition and solvent used for the." This invention offers processes for CVD that enable the use of a new metallic organic compound as a raw material resource. The process involves several steps, including adding a metallic organic compound to a liquid of a compound with a similar group, preparing a solution, vaporizing the solution, decomposing the metallic organic compound, and depositing a metallic film on a substrate. This patent showcases her expertise and creativity in the field.

Career Highlights

Megumi Kurihara is associated with Tri Chemical Laboratory Inc., where she continues to innovate and develop new technologies. Her work has garnered attention for its potential applications in various industries.

Collaborations

She has collaborated with notable colleagues, including Machida Hideaki and Nakagawa Masakazu, contributing to a dynamic research environment.

Conclusion

Megumi Kurihara's contributions to chemical vapor deposition highlight her role as a leading inventor in her field. Her innovative processes and dedication to research continue to influence advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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