The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 1999

Filed:

Apr. 18, 1997
Applicant:
Inventors:

Machida Hideaki, Yamanashi, JP;

Nakagawa Masakazu, Yamanashi, JP;

Megumi Kurihara, Yamanashi, JP;

Hiroshi Kokubun, Yamanashi, JP;

Masamichi Shigyo, Yamanashi, JP;

Sudoh Hiroshi, Yamanashi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
4272481 ; 427252 ; 4272551 ; 4272553 ; 427229 ;
Abstract

The present invention offers processes for CVD (chemical vapor deposition) that enables one to use a new metallic organic compound as a raw material resource. The present invention involves the steps of: adding a metallic organic compound having a group capable of becoming free to a liquid of a compound having the same group as the group capable of becoming free of the metallic organic compound to prepare a solution; vaporizing the solution; decomposing the metallic organic compound; and depositing a metallic film on a substrate.


Find Patent Forward Citations

Hideaki, Machida. (1999). Processes for the chemical vapor deposition and solvent used for the (U.S. Patent No. 5900279). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5900279

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…