Hillsboro, OR, United States of America

Medhat Khalil

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Medhat Khalil. Retrieved from https://idiyas.com/inventor/medhat-khalil

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Medhat Khalil: Innovator in Semiconductor Manufacturing

Introduction

Medhat Khalil is a prominent inventor based in Hillsboro, Oregon. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique manufacturing method that enhances the efficiency of semiconductor devices.

Latest Patents

Medhat Khalil holds a patent for a semiconductor device manufacturing method. This method involves etching a semiconductor material using plasma, forming a damage layer on the material, and subsequently removing this layer. This process allows for the creation of fine patterns with a vertical cross-section using compound semiconductor materials, all while maintaining a relatively low temperature.

Career Highlights

Khalil is currently employed at Hitachi High-Tech Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing manufacturing techniques that are crucial for the development of modern electronic devices.

Collaborations

Throughout his career, Medhat has collaborated with notable colleagues, including Yohei Ishii and Kathryn Maier. These partnerships have fostered an environment of innovation and creativity, leading to groundbreaking advancements in their field.

Conclusion

Medhat Khalil's contributions to semiconductor manufacturing exemplify the spirit of innovation. His patented methods are paving the way for future advancements in technology. His work at Hitachi High-Tech Corporation continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…