Company Filing History:
2 out of 3,781 
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Years Active: 2008-2011
Title: Maya Itoh: Innovator in Semiconductor Technology
Introduction
Maya Itoh is a prominent inventor based in Hyogo, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her innovative work has paved the way for advancements in manufacturing methods and exposure techniques.
Latest Patents
Maya's latest patents include a pattern forming method, a semiconductor device manufacturing method, and an exposure mask set. The pattern forming method involves a two-step exposure process using dipole illumination. In the first exposure process, only a grating-pattern forming region is exposed. The second exposure process focuses on a standard-pattern forming region. Following these processes, a development process is conducted to obtain a resist pattern. The masks used in these processes feature light blocking patterns tailored to their respective regions, enhancing the precision of semiconductor manufacturing.
Career Highlights
Throughout her career, Maya Itoh has worked with notable companies such as Renesas Technology Corporation and Renesas Electronics Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking innovations in semiconductor technology.
Collaborations
Maya has collaborated with esteemed colleagues, including Takeo Ishibashi and Takayuki Saito. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.
Conclusion
Maya Itoh's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading innovator in the field. Her work continues to influence advancements in manufacturing methods and exposure techniques, solidifying her legacy as a significant figure in the industry.