The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2011
Filed:
Jan. 05, 2010
Takeo Ishibashi, Tokyo, JP;
Takayuki Saito, Tokyo, JP;
Maya Itoh, Hyogo, JP;
Shuji Nakao, Tokyo, JP;
Takeo Ishibashi, Tokyo, JP;
Takayuki Saito, Tokyo, JP;
Maya Itoh, Hyogo, JP;
Shuji Nakao, Tokyo, JP;
Renesas Electronics Corporation, Kawasaki-shi, JP;
Abstract
First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to obtain a resist pattern. A mask for the first exposure process is such that a light blocking pattern is formed on the whole surface of a standard-pattern mask part corresponding to the standard-pattern forming region. A mask for the second exposure is such that a light blocking pattern is formed on the whole surface of a grating-pattern mask part corresponding to the grating-pattern forming region.