Maxine Fassberg

Title: Maxine Fassberg: Innovator in Semiconductor Protection

Introduction

Maxine Fassberg is a prominent inventor based in Beaverton, OR (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of protective coatings for integrated circuits. Her innovative work has led to the development of a patented process that enhances the reliability and performance of semiconductor devices.

Latest Patents

Maxine Fassberg holds a patent for a "Polyimide process for protecting integrated circuits." This process involves forming a protective polyimide layer over a semiconductor substrate. The method includes curing a deposited polyamic acid layer at a temperature sufficient to reduce the etch rate of the acid layer when exposed to a developer. After forming a photoresist masking layer over the polyamic acid, the substrate is exposed to a developer to define bonding pad openings. The developer permeates into the acid layer, forming a salt in the regions beneath the openings. Subsequent hardbaking imidizes the polyamic acid, while the salt regions remain unaffected. Finally, removing the photoresist layer develops the polyimide, which removes the salt regions to expose the underlying bonding pads. This innovative approach significantly improves the manufacturing process of integrated circuits.

Career Highlights

Maxine Fassberg has had a distinguished career at Intel Corporation, where she has been instrumental in advancing semiconductor technologies. Her expertise in materials science and engineering has allowed her to contribute to various projects that enhance the performance and durability of electronic devices.

Collaborations

Throughout her career, Maxine has collaborated with notable colleagues, including Melton C Bost and Krishnamurthy Murali. These partnerships have fostered innovation and have led to the successful development of new technologies in the semiconductor industry.

Conclusion

Maxine Fassberg's contributions to semiconductor technology through her patented processes demonstrate her commitment to innovation and excellence. Her work continues to influence the field, paving the way for advancements in integrated circuit protection.