This inventor holds 1 USPTO granted patent. Top assignees: Carboncompetence Gmbh, Yg-1 Co., Ltd. Active years: 2026.
Company Filing History:
1 out of 2 
1 out of 2 Years Active: 2026
Title: Maximilian Steinmüller: Innovator in Chemical Vapor Deposition Technology
Introduction
Maximilian Steinmüller is a notable inventor based in Innsbruck, Austria. He has made significant contributions to the field of chemical vapor deposition, particularly in the application of doped diamond layers. His innovative approach has implications for various industrial applications.
Latest Patents
Steinmüller holds a patent for a "Method for applying a doped diamond layer to a substrate by chemical vapour deposition." This patent describes a device and process for applying a doped diamond layer to a substrate through chemical vapor deposition. The device features a deposition chamber for holding the substrate, a gas activation element in the form of a hollow body with a flow channel for process gas, an outlet opening leading into the deposition chamber, a heating device for heating the wall of the gas activation element, and a solid precursor within the flow channel.
Career Highlights
Throughout his career, Steinmüller has worked with several companies, including Carbon Competence GmbH and YG-1 Co., Ltd. His work has focused on advancing technologies related to diamond coatings and their applications in various industries.
Collaborations
Steinmüller has collaborated with notable individuals in his field, including Detlef Steinmuller and Doris Steinmuller-Nethl. These collaborations have contributed to the development and refinement of his innovative technologies.
Conclusion
Maximilian Steinmüller is a prominent figure in the field of chemical vapor deposition, with a patent that showcases his innovative approach to applying doped diamond layers. His contributions continue to influence advancements in this technology.